PHOSPHOROUS and formation of the phosphor silicate glass

PHOSPHOROUS
DIFFUSION:

Phosphorus
diffusion is presently the first technique for electrode fabrication in
semiconducting material (si) electric cell process. The diffusion depends on
numerous factors of that temperature and gaseous environment is most
significant .P-type semiconducting material wafers are wide utilized in star
industries and thus diffusion technologies are developed to deposit n-type
doping parts to make the contact. As a result of its low boiling temperature (105.8 ?C), at
temperature between 850-900 *c within the diffusion chamber, POCI3 is decay
into straightforward phosphorus compounds like P4, P8, P2O5, etc. The
phosphorus diffusion fabrication of crystalline semiconducting material
electric cell with electrode diffusion, surface passivation and screen printing
of conductor ends up in formation of n+ kind electrode at the highest surface
of the wafer. Phosphorus oxychloride (POCI3) could be a liquid supply that
vaporizes at temperature itself thus it ought to be unbroken in cool place. For
the diffusion method, the vapors are administrated by the N2 gas and O2 is
passed through another valve. The reaction takes place, the phosphorous
oxychloride reacts with O2 forms P2O5 and so the P2O5 reacts with the
semiconducting material to allow the silicon oxide and therefore the
phosphorus. Pre-deposition involves the formation of phosphorus oxide films on
the semiconducting material substrate .throughout installation, phosphorus
oxide film acts as an infinite supply for phosphorus diffusion into the si
substrate. Throughout pre deposition, Phosphorus oxide (P2O5) forms on the
surface of the wafers by the reaction of phosphorus with O2. The P2O5
immediately reacts with the semiconducting material by leading to diffusion of
phosphorus and formation of the phosphor silicate glass (PSG).  The
Phosphorus atoms placed at the PSG-SI interface penetrate through the SI wafer.

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